Overview: Natcast seeks public feedback on a proposed research initiative for monolithic backend of line (BEOL) interconnects, focusing on innovative materials and integrated processes.

Background: The historical gains in power and performance associated with transistor density improvements are increasingly counterbalanced by heightened resistance (R) and capacitance (C) resulting from tighter pitches within the BEOL interconnects. This program aims to explore novel materials and integrated processes to address the interconnects’ RC delay.

Objective: The primary objective of this RFI is to gather insights and recommendations from a broad range of stakeholders to help shape the R&D roadmap for a potential on-die BEOL interconnects NSTC research program. Natcast invites industry, academia, and research partners to identify gaps in standards and challenges in transitioning from proof-of-concept demonstrations in the lab to reliable and scalable manufacturing solutions. This RFI targets three main areas: novel conducting materials, low-k ILD materials and integrated processes. Innovations related to packaging interconnects will be covered in separate programs. 

Who should respond: This RFI seeks input from a broad range of organizations that may benefit from such a research program. This includes foundries, IDMs, materials suppliers, equipment vendors, academia, startup companies, small businesses, technology incubators, government labs, federally funded research and development centers (FFRDCs), university applied research centers (UARCs), the defense industrial base, and other commercial semiconductor companies.

Deadline for submissions: Friday, August 1, 2025, at 5:00 PM EDT

Questions? Please email [email protected].