Extreme Ultraviolet (EUV) lithography is the cornerstone technology for advancing semiconductor innovation beyond the 7nm node and enabling continued scaling in accordance with Moore’s Law.
The CHIPS for America Extreme Ultraviolet (EUV) Accelerator, an NSTC facility (EUV Accelerator), was established to provide NSTC Members with access to state-of-the-art EUV technologies, capabilities, resources, and collaboration to advance their unique innovations and research needs. Its anticipated opening is July 2025, providing access to ASML’s standard numerical aperture EUV lithography system (the 0.33 NA tool) in 2025 and to its high numerical aperture EUV lithography system (the 0.55 NA tool) in 2026.
NSTC Members and prospective Members are invited to join us for an initial look into the EUV Accelerator. This webinar will highlight:
- Opportunities presented by the EUV Accelerator
- Technical capabilities (unit, module, and full flow including 2nm process)
- Ways for NSTC Member companies to access the EUV Accelerator to further their research and prototyping needs
This webinar will be led by Natcast’s recently announced Director of the EUV Accelerator, Craig Child and Senior Director, Strategic Business Development, Christine Dunbar.
When: Wednesday, May 28, 2025 – 2:00pm ET
Where: virtual webinar
Register: this event is open to NSTC Members and prospective Members. Please register here. (Webinar login information will be sent within 24 hours prior to the event.)
Registration deadline: Tuesday, May 27, 2025 at 12:00pm ET
Additional information on the EUV Accelerator: last fall, Natcast and the Department of Commerce announced the location of the EUV Accelerator at the NY CREATES Albany NanoTech Complex. The EUV Accelerator will focus on advancing state of the art EUV technology and the R&D that relies on it. It will provide access for NSTC Members to conduct research and collaborate in the facility as well as space for Natcast researchers and staff operations. Learn more.